| Title |
A Study on the Bottom Impedance Tuning Circuit of PE-CVD Chamber |
| Authors |
왕현철(Hyun-Chul Wang) ; 서화일(Hwa-Il Seo) |
| DOI |
https://doi.org/10.5573/ieie.2020.57.5.29 |
| Keywords |
Semiconductor equipment; PE-CVD; Impedance tuned circuit; RF system; Electrode |
| Abstract |
The most important elements of a semiconductor equipment using plasma are the efficiency and control of plasma. The efficiency of plasma relies on how well RF Current Path flowing between upper and bottom electrodes placed inside a chamber could be controlled without any loss. This thesis proposes a method of adjusting RF Current while matching impedance on the bottom electrode. In addition, a bottom battery electrode structure used in a common PE-CVD (Plasma-enhanced Chemical Vapor deposition) system and a bottom electrode tuning circuit are tested and compared with each other. This thesis had confirmed that the proposed method is more efficient than the existing method, and it is able to control deposition rate (D/R) and the features of a thin film. |