| Title |
Tribological Properties of VOx Thin Films Fabricated by Dual Magnetron Sputtering |
| DOI |
https://doi.org/10.5573/ieie.2024.61.5.23 |
| Keywords |
VOx; Dual magnetron sputtering; Hardness; Adhesion; Contact angle |
| Abstract |
The VOx thin film was deposited using a dual magnetron sputtering system with two 4inch V2O5 target. VOx thin films were deposited according to the RF power, and the surface, structural, and tribological properties were investigated. The increase in RF power during the deposition of VOx thin films grew the thin films more uniformly and densely, and the proportion of V atoms in the thin films was increased from 26 % to 37 %. In addition, the crystalline property of the VOx thin film deposited with the increase in RF power did not affect the main crystallinity, but a V2O3(113) peak indicating small crystallinity was confirmed. It was confirmed that as the RF power increased, the contact angle on the surface of thin film increased and the hydrophilic properties decreased. These results show that the sputtering effect increases with the increase in RF power, which is related to an increase in nano-crystallinity with small grain distribution on the surface due to an increase in the ratio of V atoms in the thin film. The the hardness and elastic modulus values of the VOx thin film increased with the increase in RF power, and the critical load value, which indicates the adhesion between the substrate and the thin film, increased. As a result it is believed that the RF power increases during the film deposition was related to the improvement of the sputtering effect, and also, attributed to the increase of the binding force in ion networks. In the result, the improvement of tribological properties in the VOx films is related to the increase of the RF power during the film deposition. |