| Title |
Chloroform Degradation by Water-surface Discharge |
| Authors |
유승민 ( Seung Min Ryu ) ; 유승열 ( Seung Ryul Yoo ) ; 박준석 ( Jun Seuk Park ) ; 홍은정 ( Eun Jung Hong ) ; 노태협 ( Tai Hyeop Lho ) |
| Keywords |
Chloroform; Degradation; Plasma discharge; Trihalomethane |
| Abstract |
Chloroform is harmful volatile organics and representatives of Trihalomethane (THM). Well-known removal methods of Chloroform are photo oxidation or OH radical oxidation. Plasma on water surface at slightly vacuum condition (45 torr) can produce OH radical and it will help chloroform removal. 81.5% of chloroform is removed by vacuum and plasma in 10 min. Plasma can totally oxidize it till 2.8% and partially oxidize chloroform up to 18.5%. Water-surface plasma is good method to remove chloroform in short time. |