| Title |
Removal of Total Organic Carbon and Micropollutants in Tertiary Treated Sewage by Medium Pressure UV/H2O2 |
| Authors |
이재엽 ( Lee Jai-yeop ) ; 김일호 ( Kim Ilho ) |
| DOI |
https://doi.org/10.15681/KSWE.2020.36.4.314 |
| Keywords |
AOP; Micropollutant; Pharmaceuticals; TOC; UV |
| Abstract |
This study evaluated the applicability of UV-AOP process using medium-pressure UV lamp and H2O2 to remove TOC and emerging micropollutants in the effluent from a sewage treatment plant. The UV lamp with higher output(1.6∼8.0 kW) showed slightly higher amount of power in removing TOC of 1 mg/L(0.09 kWh/mg/L∼0.11 kWh/mg/L), however it was found that there was no significant difference for each cases. In addition, under the condition that the H2O2 concentration is sufficient, as the power consumption of the UV lamp increases, the unit TOC removal concentration per unit H2O2 decomposition concentration also increases, resulting in effective removal of TOC. The removal rate of 7 new trace contaminants, such as antibiotics by the UV-AOP tested, was at least 89.4%, and the ability to remove the emerging micro pollutants in the process was very effective. But, it was judged that it could not be excluded that the probablity of transforming to oxidated by-product in the case of a low TOC removal efficiency. Depending on the operating conditions of the UV and H2O2 processes, a higher BOD concentration is found in the treated water than in the influent, and it is necessary to review the UV power and proper injection conditions of H2O2 to maintain the BOD concentration increase below a certain level. |