| Title |
Performance Evaluation of Domestic and Foreign MBP for UPW Production in Semiconductors |
| Authors |
김재현(Jae-Hyun Kim) ; 이형돈(Hyung-Don Lee) ; 방우혁(Woo-Hyuck Bang) ; 여인설(Inseol Yeo) ; 박찬규(Chan-gyu Park) |
| DOI |
https://doi.org/10.15681/KSWE.2025.41.3.143 |
| Keywords |
Ion Exchange Resin (IER); Mixed Bed Ppolisher (MBP); Performance evaluation; Semiconductors; Ultra Pure Water (UPW) |
| Abstract |
We developed a performance evaluation method to objectively compare and test the performance of mixed bed polishers (MBPs) used in ultrapure industrial production to promote and supply domestically produced equipment for semiconductor-grade ultrapure water (UPW) production, particularly MBPs units. The evaluation criteria included resistance, metal concentration removal efficiency, and metal extraction from resins. We tested both domestic and foreign-produced ion-exchange resins in compacted MBPs using these methods and compared the results. The tests showed that both domestic and foreign MBPs exhibited similar ion removal efficiencies, as indicated by effluent resistance. We found that both domestic and foreign MBPs achieved an average of 17.9 MΩ cm after processing. In contrast, the metal concentration removal performance varied depending on the specific metal elements and the MBP used. Domestic MBPs showed higher performance in removing Li, Cu, Co, Al, Pb, Na, Mn, and V, whereas foreign MBPs had higher performance in removing Cr, Mg, As, Ni, and Fe. In terms of extraction, both MBPs required similar times for the process to conclude, although domestic MBPs showed higher extraction levels of Ni, Mg, and Al. Overall, the comparison indicated that domestically produced MBPs demonstrated performance that was nearly identical to their foreign counterparts. |