| Title |
Dielectric Properties of P(VDF/TrFE) Thin Films Prepared by Vapor Deposition Method |
| Authors |
정무영(Jeong, Mu-Yeong) ; 윤종현(Yun, Jong-Hyeon) ; 이선우(Lee, Seon-U) ; 박수홍(Park, Su-Hong) ; 유도현(Yu, Do-Hyeon) ; 이덕출(Lee, Deok-Chul) |
| Keywords |
Ferroelectric copolymers ; P(VDF/TrFE) ; Vapor deposition ; Substrate temperature ; Dielectric properties |
| Abstract |
P(VDF/TrFE) copolymer thin films with 70/30 and 80/20 mol% VDF (polyvinylidene fluoride) and TrFE (trifluoroethylene) rates were prepared by using a vapor deposition method, During thin films were prepared, the substrate temperatures were maintained at 30 °C and 120 °C, and the heating source temperature was fixed at 350 °C. Contary to PVDF homopolymer, P(VDF/TrFE) copolymers showed the Curie point(Tc) below the melting point. The Curie point (Tc) and the melting point of the P(VDF/TrFE) copolymers were changed as a function of substrate temperature and the VDF mol%. The Curie point and the melting point of P(VDF/TreFE) thin films decreased and increased with increasing substrate temperature, respectively. Also with increasing VDF mol%, the melting point decreased slightly, however the Curie point increased. |