| Title |
Preparation of ZnO thin film for SAW filter |
| Authors |
성하윤(Seong, Ha-Yoon) ; 양진석(Yang, Jin-Seok) ; 금민종(Keum, Min-Jong) ; 손인환(Son, In-Hwan) ; 김경환(Kim, Kyung-Hwan) |
| Keywords |
Preferred orientation ; FTS(Facing Targets Sputtering) ; ZnO thin Film |
| Abstract |
Piezoelectric ZnO thin films by Facing Targets Sputtering(FTS) method were deposited on slide glass. The Facing Targets Sputtering system can deposit thin film at plasma-free condition and change the deposition condition in wide range. The characteristics of ZnO thin films changed with power, working pressure and substrate temperature were investigated by XRD(x-ray diffractometer), alpha-step(Tencor) and SEM(Scanning Electron Microscopy) analyses. In the results, we suggest that FTS system is very suitable for the preparation of high quality ZnO thin films with good c-axis orientation. |