| Title |
Fabrication of 3-D Structures by Inclined and Rear-side Exposures |
| Authors |
이준섭 ; 신현준 ; 문성욱 ; 송석호 ; 김태엽 |
| Keywords |
선택위치노광 ; 경사노광 ; 후면노광 ; 반사방지막 SU-8 ; V-groove |
| Abstract |
3D microstructures with different side-wall angles and different scales are fabricated by both methods of inclined exposure and rear-side exposure at each of selected areas on a same substrate. Conventional methods of inclined exposure are used to make side-walls with a same inclined angle on one substrate and to get a scale error due to front-side exposure through thick photoresist layer, But, by using the proposed method, we are able to fabricate 3D microstructures on a same substrate with various side-wall angles and accurate dimensions as the original design. In the rear-side exposure, UV exposure light reflects from the chromium mask pattern after passing through the thick photoresist layer, resulting in fabrication of well-defined, inclined 3D structures inside the thick photoresist layer. |