| Title |
Effects of the Sputtering Thickness and the Incident Angle of Pt Film Deposition as a Counter Electrode for Dye-sensitized Solar Cells |
| Authors |
김희제(Kim, Hee-Je) ; 여태빈(Yeo, Tae-Bin) ; 박성준(Park, Sung-Joon) ; 김휘영(Kim, Whi-Young) ; 서현웅(Seo, Hyun-Woong) ; 손민규(Son, Min-Kyu) ; 채원용(Chae, Won-Yong) ; 이경준(Lee, Kyoung-Jun) |
| Keywords |
Pt Counter electrode ; Sputtering thickness and incident angle ; RF magnetron plasma ; Dye-sensitized solar cell |
| Abstract |
Sputter deposition on a Pt counter electrode was studied using radio frequency (RF) plasma as the improvement of incident photon to current conversion efficiency (IPCE) for dye-sensitized solar cells (DSCs). Effects of the sputtering thickness and the incident angle on a Pt counter electrode for DSCs were investigated. Experiments to get the optimal sputtering time for the performance of the DSCs were carried out. And it is found that the optimized sputtering time was 120 seconds, in addition, the incident angles of the substrate was adjusted from 0° to 60°. The maximum efficiency of 5.37% was obtained at the incident angle of 40° with an active cell area of 1cm^2. |