| Title |
A Study on the Electrical Characteristic of Organic Thin Film by Physical Vapor Deposition Method |
| Keywords |
PVDF ; Thin Films ; Mobility ; Ion Density ; Molecular Structure |
| Abstract |
The purpose of this paper is to discuss the fabrication of \beta-PVDF(\beta-Polyvinylidene fluoride, {\beta}-PVF_2) organic thin films using the vapor deposition method. Vapor deposition was performed under the following conditions: the temperature of evaporator, the applied electric field, and the pressure of reaction chamber were 270^{\circ}C, 142.4 kV/cm, and 2.0×10^{-5}\;Torr, respectively. The molecular structure of the evaporated organic thin films were evaluated by a FT-IR. The results showed that the characteristic absorption peaks of \beta-form crystal increase from 72% to 95.5% with an increase in the substrate temperature. In the analysis of the electric characteristics, the abnormal increases in the relative dielectric constant and the dielectric loss factor in the regions of low frequency and high temperature are known to be caused by inclusion of impurity carriers in the PVDF organic thin films. In order to analyze quantitatively the abnormalities in the conductivity mechanism caused by ionic impurities, the product of the ion density and the mobility that affect the electrical property in polymeric insulators is analyzed. In the case of a specimen produced by varying the substrate temperature from 30^{\circ}C to 105^{\circ}C, the product of mobility and the ion density decreased from 4.626×10^8 to 8.47×10^7/V{\cdot}cm{\cdot}s. This result suggests that the higher the substrate temperature is maintained, the better excluded the impurities are, and the more electrically stable material can be obtained. |