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The Transactions of the Korean Institute of Electrical Engineers

The Transactions of the Korean Institute of Electrical Engineers

ISO Journal TitleTrans. Korean. Inst. Elect. Eng.
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  3. 2020-01 (Vol.69 No.1)
  4. 10.5370/KIEE.2020.69.1.211
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References

1 
A. Perret, P. Chabert, J. Jolly, J.-P. Booth, 2005, Ion energy uniformity in high-frequency capacitive discharges, Applied Physics Letters., Vol. 86, pp. 021501DOI
2 
H. Curtins, N. Wyrsch, M. Favre, A. V. Shah, 1987, Influence of plasma excitation frequency fora-Si:H thin film deposition, Plasma Chemistry and Plasma Processing, Vol. 7, No. 3, pp. 267-273DOI
3 
M. Heintze, R. Zedlitz, G. H. Bauer, 1993, Analysis of high- rate a-Si:H deposition in a VHF plasma, Journal of Physics D: Applied Physics, Vol. 26, No. 10, pp. 1781-1786DOI
4 
H. Schmidt, 2006, Characterization of a high-density, large-area VHF plasma source, Ph.D. dissertation, EPFL, pp. 6-8DOI
5 
L. Sansonnens, J. Schmitt, 2003, Shaped electrode and lens for a uniform radio-frequency capacitive plasma, Applied Physics Letters, Vol. 82, No. 2, pp. 182-184DOI
6 
J. P. M. Schmitt, M. Elyaakoubi, L. Sansonnens, 2002, Glow discharge processing in the liquid crystal display industry, Plasma Sources Science and Technology, Vol. 11, No. 3A, pp. A206-A210DOI