| Title |
A Study on the Control Algorithm for the 300[㎜] Wafer Edge Exposure of ArF Type using A Linear CCD Sensor |
| Authors |
Hong-Lae Park ; Cheol-Gyu Lee |
| Keywords |
300[㎜] Wafer ; Wafer Edge Exposure(WEE) ; Control Algorithm |
| Abstract |
This study presents a process control of the wafer edge exposure (WEE) used in 300[㎜] wafer environment WEE, as a key module of the overall track system (coater and developer) for making patterns on wafer, is a system to expose the UV-ray on the wafer to remove a photo resist around edge of the wafer. It can measure, memorize and control the distance and angles from wafer center to edge. Recently in the 300[㎜] semiconductor fabrication, the track system strongly requires that WEE station has a controller with high throughput and accuracy to increase process efficiency. We have designed and developed the controller, and present here a WEE control algorithm and experimental results. |