| Authors |
Ki-Young Jung ; Hyuk-Moon Kwon ; Jin-Woo Ahn ; Dong-Hoon Lee ; Won-Zoo Park ; Youl-Moon Sung |
| Keywords |
Plasma enhanced chemical vapor deposition ; Carbon nanotubes ; RF plasma ; Fe catalyst |
| Abstract |
Plasma enhanced chemical vapor deposition (PECVD) is commonly used for Carbon nanotubes (CNTs) fabrication, and the process can easily be applied to industrial production lines. In this works, we developed novel magnetized radio frequency PECVD system for one line process of CNTs fabrication for charge storable electrode application. The system incorporates aspects of physical and chemical vapor deposition using capacitive coupled RF plasma and magnetic confinement coils. Using this magnetized RF-PECVD system, we firstly deposited Fe layer (about 200[nm]) on Si substrate by sputter method at the temperature of 300[℃] and hence prepared CNTs on the Fe catalyst layer and investigated fundamental properties by scanning electron microscopy (SEM) and Raman spectroscopy (RS). High-density, aligned CNTs can be grown on Fe/Si substrates at the temperature of 600[℃] or less. |