D. Tetzlaff, M. Dzinnik, J. Krügener, Y. Larionova, S. Reiter,
M. Turcu, R. Peibst, U. Höhne, J.-D. Kähler, and T.
F. Wietler, “Introducing pinhole magnification by selective
etching: application to poly-Si on ultra-thin silicon oxide
films,”
Energy Procedia, vol. 124, pp. 435-440, September
2017.
[
CrossRef]