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“JSTS has been indexed and abstracted in the SCIE (Science Citation Index Expanded) since Volume 9, Issue 1 in 2009. Furthermore, it continues to maintain its listing in the SCOPUS database and is recognized as a regular journal by the Korea Research Foundation.

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  4. 10.5573/JSTS.2019.19.2.178
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REFERENCES

1 
Nomura K., Ohta H., Ueda K., Kamiya T., Hirano M., Hosono H., Jun. 2003, Thin-film transistor fabricated in single-crystalline transparent oxide, Science, Vol. 300, No. 5623, pp. 1269-1272DOI
2 
Nomura K., Ohta H., Takagi A., Kamiya T., Hirano M., Hosono H., Nov. 2004, Room-temperature fabri-cation of transparent flexible thin-film transistors using amorphous oxide semiconductors, Nature, Vol. 432, No. 7016, pp. 488-492DOI
3 
Kim J. K., Oh S. H., Jeong S. A., Moon S. J., Imura K., Okada T., Noguchi T., Yun E. J., Bae B. S., Mar. 2016, Electrical Characteristics of a-IGZO TFTs with SiO2 Gate Insulator Prepared by RF Sputtering, J. Dis. Tech., Vol. 12, No. 3, pp. 1301-1305Google Search
4 
Loisel B., Guenais B., Poudoulec A., Henoc P., Jul. 1984, Flash lamp crystallization of amorphous silicon films on glass substrates, Thin Solid Films, Vol. 117, No. 2, pp. 117-123DOI
5 
Pécz B., Dobos L., Panknin D., Skorupa W., Lioutas C., Vouroutzis N., Mar. 2005, Crystallization of amorphous-Si films by flash lamp annealing, Appl. Surf. Sci., Vol. 242, No. 1-2, pp. 185-191DOI
6 
Jin W. B., Park Y., Kim B. K., Kim H. J., Hwang J. H., Chung H., Park J. H., Kim D. H., Park S., Sep. 2014, Thermal warpage of a glass Flash lamp crystallization of amorphous silicon films on glass substrates, Int. J. Ther. Sci., Vol. 83, pp. 25-32Google Search
7 
Hwang J. H., Kim H. J., Kim B. K., Jin W. B., Kim Y., Chung H., Park S., May. 2015, Scanning multishot irradiations on a large-area glass substrate for Xe-Arc flash lamp crystallization of amorphous silicon thin film, Int. J. Ther. Sci., Vol. 91, pp. 1-11DOI
8 
McMahon R. A., Smith M. P., Seffen K. A., Voelskow M., Anwand W., Skorup W., Jun. 2007, Flash-lamp annealing of semiconductor materials-Applications and process models, Vacuum, Vol. 81, No. 10, pp. 1301-1305DOI
9 
Kim Y., Park S., Kim B. K., Kim H. J., Hwang J. H., Dec. 2015, Xe-arc flash annealing of indium tin oxide thin-films prepared on glass backplanes, Int. J. Heat and Mass Tran., Vol. 91, pp. 543-551DOI
10 
Park S. C., Kim D., Shin H., Lee D. K., Zhang X., Park J., Choi J. S., Mar. 2016, Advanced photo-annealing of indium zinc oxide films for thin-film transistors using pulse UV light, J. Inform. Dis., Vol. 17, No. 1, pp. 1-7DOI
11 
Gebel T., Rebohle L., Fendler R., Hentsch W., Skorupa W., Voelskow M., Anwand W., Yankov R. A., Oct. 10-13, 2006, Millisecond annealing with flashlamps : Tool and process challenges, Proc 14th International Conference on Advanced Thermal Processing of Semiconductors RTP2006, Kyoto, Japan, pp. 47-55DOI
12 
Kim H. S., Dhage S. R., Shim D. E., Hahn H. T., Dec. 2009, Intense pulsed light sintering of copper nanoink for printed electronics, Appl. Phys. A., Vol. 97, pp. 791-798DOI