| Title |
A Study on Asymmetric Pulsed DC Plasma Power Supply with Energy Recovery Circuit |
| Authors |
Dae-Hyeok Choo ; Sung-Hwan Yoo ; Joohn-Sheok Kim ; Ki-Joon Han |
| DOI |
10.6113/TKPE/2013.18.6.593 |
| Keywords |
plasma power supply; magnetron sputtering; asymmetric pulsed DC |
| Abstract |
The asymmetric pulsed DC reactive magnetron sputtering system is widely used for the high quality plasma sputtering process such as a thin film deposition. In asymmetric pulsed DC power supply a reverse voltage is applied to the target periodically to minimize arc discharging effect. When sputtering in the mid-frequency range (20-350 kHz), the periodic target voltage reversals suppress arc formation at the target and provide long-term process stability. Thus, high quality, defect-free coatings of these materials can now be deposited at competitive rates. In this paper, a new style asymmetric pulsed DC power supply including mid-transformer is presented. In the proposed, an energy recovery circuit is adopted to reduce the mutual inductance of the transformer. As a result, the system dynamics of the voltage control loop is increased highly and the non-linear voltage boosting effect of the conventional system is removed. This work was proved through simulation and laboratory based experimental study. |